Calibration anchors
Public HJT process windows the twin's physics is tuned against
Cell-side performance
| Metric | Industry window | Source | Notes |
|---|---|---|---|
| Cell efficiency η | 23.5 – 24.7 % | Kaneka, LONGi HPBC, Meyer Burger, Maxeon | M10 production HJT, late 2024 |
| Implied V_oc (iV_oc) | 740 – 750 mV | Kaneka public PV Tech disclosures | Post-PECVD passivation |
| J₀ | 5 – 10 fA/cm² | ITRPV 2024 | Post i-layer optimisation |
| Sheet resistance (TCO front) | 30 – 80 Ω/□ | ISFH / Helmholtz HZB | ITO/IWO 80–100 nm |
| Transmission (400-1100 nm avg) | > 85 % | TCO supplier datasheets | Critical for J_sc |
| Cell P_max (M10) | 7.2 – 7.4 W | LONGi HPBC release | Nominal 7.3 W per cell used as twin baseline |
Module-side performance
| Metric | Industry window | Source | Notes |
|---|---|---|---|
| Module power (72-cell M10) | 580 – 620 W | Tier-1 module datasheets | — |
| Cure α (lamination) | > 0.85 | DuPont EVA application notes | Crosslink density target |
| Bubble defect rate | < 0.5 % | IEC 61215 | Visual + EL screening |
| Microcrack rate (M10, MBB) | < 1 % | VDMA PV roadmap | — |
Process windows
| Metric | Industry window | Source | Notes |
|---|---|---|---|
| PECVD i-layer thickness | 5 – 8 nm | Kaneka 2014 patent literature | Below 4 nm → epi growth |
| PECVD deposition T | 180 – 220 °C | Meyer Burger SmartLine specs | Above 220 °C → H effusion |
| TCO O₂/(Ar+O₂) | 1.5 – 2.5 % | ULVAC sputter manuals | — |
| Solder iron T | 220 – 260 °C | Cell-to-ribbon process windows | — |
| Lamination plate T | 148 – 155 °C | Bürkle / Meier press specs | — |
| Vacuum hold | 240 – 480 s | DuPont EVA processing guide | — |
RIL Defect Catalog Adopted (18 defects)
Optimon recognizes, attributes, and reasons about RIL's actual defect taxonomy. The 18 defects below drive the EL Gallery, the Quality Inspection page, the Bayesian Root-Cause hypothesis space, the fault injectors, and Ved's responses. Source for all entries: RIL FI Defect Specification (Choice column accepted).
| Code | Name | Type | Surface | Tier rule |
|---|---|---|---|---|
| 101 | Crack cell (middle) | Cell Defect | EL | Not allowed in A/B; allowed in C if crack piece doesn't overlap |
| 102 | Crack cell (outside wire) | Cell Defect | EL | Not allowed in A/B; allowed in C if crack piece doesn't overlap |
| 112 | Crushed cell | Cell Defect | EL | Not allowed in any module → Scrap |
| 129 | Cell chip | Cell Defect | EL | A: ≤1×2 mm, max 1/cell, max 3 cells/module |
| 106 | Broken finger | Cell Defect | EL | A: ≤5 broken fingers, total gap ≤30 mm |
| 108 | Broad finger | Cell Defect | EL | A: width ≤0.5 mm |
| 115 | Incomplete deposition | Cell Defect | EL | Refer to contamination scheme |
| 117 | Cell flake | Cell Defect | EL | Refer to contamination scheme |
| 151 | String spacing | Cell Defect | EL | A: 0.5–4.5 mm |
| 156 | Uneven string | Cell Defect | EL | A: displacement ≤2.5 mm |
| 198 | Bubble (active) | Bubble Defect | EL | A: single ≤15 mm², total ≤25 mm² |
| 199 | Bubble (inactive) | Bubble Defect | EL | Refer to scheme |
| 143 | Glass bubble | Glass Defect | VISUAL | A: front/back W<0.5 mm, L≤1 mm, qty 3 |
| 635 | Glass broken | Glass Defect | VISUAL | Not allowed in any module → Scrap |
| 141 | Glass scratch | Glass Defect | VISUAL | A: L<50 mm, W<1 mm, qty 1 |
| 402 | Frame corner gap | Frame Defect | VISUAL | Reference scheme |
| 414 | Sealant discontinuous | Frame Sealant Defect | VISUAL | Reference scheme |
| 906 | Power output low | Power Output Defect | FLASH | Below recipe spec band |
Honesty footer
Process Twin (HJT) is a physics-driven simulator built to demonstrate Optimon's industrial intelligence approach for HJT solar manufacturing. Models are calibrated to the public HJT process windows above (Kaneka, LONGi, Meyer Burger, Maxeon, ITRPV, IEC 61215, VDMA) and tuned for operational reasoning — they are not certified to any specific OEM tool. All telemetry is generated by the on-board physics simulator. Live PLC/SCADA/MES ingest is wired but not enabled in this build. State is in-memory; persistence via Lovable Cloud is wired and can be enabled. EL imaging is procedurally generated with a defect signature library; production deployment integrates with EyeZ, Optimon's machine vision module.